Differences Between Pulsed Laser Cleaning Machines and Continuous Wave Laser Cleaning Machines

Working Principle:

Pulsed Laser Cleaning Machine: Emits high-energy, short-pulse laser beams to remove surface contaminants, with laser energy released in a very short time.

Continuous Wave Laser Cleaning Machine: Emits a continuous laser beam for cleaning, with stable laser energy output.

Cleaning Effect:

Pulsed Laser Cleaning Machine: Suitable for removing stubborn contaminants, oxide layers, and coatings, with significant cleaning effects, especially for precision components.

Continuous Wave Laser Cleaning Machine: Suitable for large-area, uniform cleaning, with stable effects, ideal for general contaminants.

Efficiency:

Pulsed Laser Cleaning Machine: High cleaning speed, especially efficient for localized stubborn contaminants.

Continuous Wave Laser Cleaning Machine: Suitable for large-area continuous operations, with stable efficiency.

Thermal Impact:

Pulsed Laser Cleaning Machine: Small heat-affected zone, suitable for precision components and heat-sensitive materials.

Continuous Wave Laser Cleaning Machine: Larger thermal impact, potentially unsuitable for heat-sensitive materials.

Energy Consumption:

Pulsed Laser Cleaning Machine: Higher energy consumption due to the generation of high-energy pulses.

Continuous Wave Laser Cleaning Machine: Lower energy consumption, with stable laser output.

Application Scenarios:

Pulsed Laser Cleaning Machine: Suitable for precision parts, cultural relic restoration, mold cleaning, etc.

Continuous Wave Laser Cleaning Machine: Suitable for large-area surface cleaning, such as metal sheets and large equipment.

Equipment Cost:

Pulsed Laser Cleaning Machine: Complex structure, higher cost.

Continuous Wave Laser Cleaning Machine: Simple structure, lower cost.

Maintenance:

Pulsed Laser Cleaning Machine: Complex maintenance, requiring regular inspection of the pulse generator.

Continuous Wave Laser Cleaning Machine: Simple maintenance, low failure rate.