Working Principle:
Pulsed Laser Cleaning Machine: Emits high-energy, short-pulse laser beams to remove surface contaminants, with laser energy released in a very short time.
Continuous Wave Laser Cleaning Machine: Emits a continuous laser beam for cleaning, with stable laser energy output.
Cleaning Effect:
Pulsed Laser Cleaning Machine: Suitable for removing stubborn contaminants, oxide layers, and coatings, with significant cleaning effects, especially for precision components.
Continuous Wave Laser Cleaning Machine: Suitable for large-area, uniform cleaning, with stable effects, ideal for general contaminants.
Efficiency:
Pulsed Laser Cleaning Machine: High cleaning speed, especially efficient for localized stubborn contaminants.
Continuous Wave Laser Cleaning Machine: Suitable for large-area continuous operations, with stable efficiency.
Thermal Impact:
Pulsed Laser Cleaning Machine: Small heat-affected zone, suitable for precision components and heat-sensitive materials.
Continuous Wave Laser Cleaning Machine: Larger thermal impact, potentially unsuitable for heat-sensitive materials.
Energy Consumption:
Pulsed Laser Cleaning Machine: Higher energy consumption due to the generation of high-energy pulses.
Continuous Wave Laser Cleaning Machine: Lower energy consumption, with stable laser output.
Application Scenarios:
Pulsed Laser Cleaning Machine: Suitable for precision parts, cultural relic restoration, mold cleaning, etc.
Continuous Wave Laser Cleaning Machine: Suitable for large-area surface cleaning, such as metal sheets and large equipment.
Equipment Cost:
Pulsed Laser Cleaning Machine: Complex structure, higher cost.
Continuous Wave Laser Cleaning Machine: Simple structure, lower cost.
Maintenance:
Pulsed Laser Cleaning Machine: Complex maintenance, requiring regular inspection of the pulse generator.
Continuous Wave Laser Cleaning Machine: Simple maintenance, low failure rate.